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1. Identificação
Tipo de ReferênciaArtigo em Revista Científica (Journal Article)
Sitemtc-m21c.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador8JMKD3MGP3W34R/3RPNPN2
Repositóriosid.inpe.br/mtc-m21c/2018/09.06.16.12   (acesso restrito)
Última Atualização2018:09.06.16.12.26 (UTC) simone
Repositório de Metadadossid.inpe.br/mtc-m21c/2018/09.06.16.12.26
Última Atualização dos Metadados2019:01.14.17.06.34 (UTC) administrator
DOI10.1063/1.5040588
ISSN2158-3226
Chave de CitaçãoUedaSouzMariPich:2018:OvShOv
TítuloOvercoming sheaths overlapping in a small diameter metallic tube with one end closed and using a high density plasma from a high power pulsed hollow cathode discharge
Ano2018
MêsAug.
Data de Acesso20 maio 2024
Tipo de Trabalhojournal article
Tipo SecundárioPRE PI
Número de Arquivos1
Tamanho3538 KiB
2. Contextualização
Autor1 Ueda, Mário
2 Souza, G. B. de
3 Mariano, Samantha de Fátima Magalhães
4 Pichon, L.
Identificador de Curriculo1 8JMKD3MGP5W/3C9JHSB
Grupo1 LABAP-COCTE-INPE-MCTIC-GOV-BR
2
3 CMS-ETES-SESPG-INPE-MCTIC-GOV-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Universidade Estadual de Ponta Grossa
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Institut Pprime - CNRS -Universite de Poitiers-ENSM
Endereço de e-Mail do Autor1 mario.ueda@inpe.br
RevistaAIP Advances
Volume8
Número1
Páginase085103
Nota SecundáriaB4_MEDICINA_II B5_MATERIAIS B5_FARMÁCIA B5_ENGENHARIAS_IV C_INTERDISCIPLINAR C_ASTRONOMIA_/_FÍSICA
Histórico (UTC)2018-09-06 16:13:13 :: simone -> administrator :: 2018
2019-01-04 16:57:10 :: administrator -> simone :: 2018
2019-01-04 17:54:31 :: simone -> administrator :: 2018
2019-01-14 17:06:34 :: administrator -> simone :: 2018
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
Tipo de Versãopublisher
ResumoHigh voltage sheaths are formed when plasmas are produced by application of high negative voltage pulses to conductive supports or components, as in Plasma Immersion Ion Implantation (PIII) treatments of materials surfaces. For parts with concave shape, as inside metal tubes, these sheaths behave quite differently according to the tube configuration and size, as well as, PIII treatment pressure of operation and pulsing parameters. In this work, an SS304 tube of 1.1 cm internal diameter and 20 cm length was pulsed typically at -0.5 to -2.6 kV, 20 µs pulse length, 500 Hz repetition rate, nitrogen pressure of 5x10-2 mbar and with one side closed configuration. Different currents (between 10 and 30 A) were used to produce plasmas with sheaths that overlapped or not, depending on the currents used. To study these sheath behaviors, a simple plasma diagnostic technique based on a bi-dimensional mapping of the deposition of sputtered materials and by etching via the plasma on a Si wafer target surface, both coming out from the tube, was used. This mapping showed clearly the border line situation between overlapping and non-overlapping sheaths in that small tube which allowed to estimate the plasma density to be around 1011 cm-3 at such a sheath condition, as previously anticipated by Sheridan. Above that border condition, nitrogen PIII was successfully obtained in such a small tube of SS304, producing TiN and Ti2N in samples of Ti6Al4V placed inside the tube, when temperatures higher than 800◦C were reached there. Below the border, no significant uptake of nitrogen was possible. Using this type of experimental set-up, it is now possible to explore different hollow cathode behaviors, efficient or high temperature (above 800◦C) PIII conditions and also new utilizations of the plasma ejected from the tube.
ÁreaFISPLASMA
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4. Condições de acesso e uso
Idiomaen
Arquivo Alvoueda_overcoming.pdf
Grupo de Usuáriossimone
Grupo de Leitoresadministrator
simone
Visibilidadeshown
Permissão de Leituradeny from all and allow from 150.163
Permissão de Atualizaçãonão transferida
5. Fontes relacionadas
Unidades Imediatamente Superiores8JMKD3MGPCW/3ET2RFS
8JMKD3MGPCW/3F358GL
Lista de Itens Citandosid.inpe.br/bibdigital/2013/09.25.21.49 3
sid.inpe.br/bibdigital/2013/10.14.21.39 3
sid.inpe.br/mtc-m21/2012/07.13.14.56.06 1
DivulgaçãoWEBSCI; PORTALCAPES; COMPENDEX.
Acervo Hospedeirourlib.net/www/2017/11.22.19.04
6. Notas
Campos Vaziosalternatejournal archivingpolicy archivist callnumber copyholder copyright creatorhistory descriptionlevel e-mailaddress format isbn keywords label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project rightsholder schedulinginformation secondarydate secondarykey session shorttitle sponsor subject tertiarymark tertiarytype url
7. Controle da descrição
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